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发明名称
Plasma processing method and apparatus
摘要
申请公布号
SG52861(A1)
申请公布日期
1998.09.28
申请号
SG19960011142
申请日期
1996.11.15
申请人
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人
OKUMURA TOMOHIRO;HARAGUCHI HIDEO;NAKAYAMA ICHIRO;YANAGI YOSHIHIRO
分类号
H01J37/32;(IPC1-7):H01L21/306;C23C16/50
主分类号
H01J37/32
代理机构
代理人
主权项
地址
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