| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resist pattern excellent in radiation transmitting property and dry etching resistance by incorporating a specified resin, a radiation sensitive acid producing agent and a solvent mixture of straight chain ketone with cyclic ketone, etc. SOLUTION: This radiation sensitive resin compsn. contains an alkali-insoluble or slightly alkali-soluble resin having an alicyclic skeleton in the principal chain and/or a side chain, contg. acid-cleavable groups and convertible into an alkali-soluble resin when the groups are cleaved, a radiation sensitive acid generating agent that produces an acid when irradiated and a solvent mixture of straight chain ketone with at least one selected from among cyclic ketone, propylene glycol monoalkyl ether acetate and alkyl 2-hydroxypropionate. A resist pattern excellent in uniformity in film thickness, adhesiveness to the substrate, sensitivity, resolution, etc., can be formed. |
