| 摘要 |
In a device for measuring feeble light and a method thereof, the device includes a feeble light amplifying device having a reaction chamber with two transparent windows as a constituent part, a detector, and two mirrors. The feeble light generated in the reaction chamber in which an etching process is in progress is amplified by the mirrors and is then detected, whereby an etching endpoint can be accurately determined. Therefore, the damage to semiconductors due to overetching or underetching can be prevented.
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