SUBSTRATE TREATING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate treating device in which no atmospheric gas infiltrates a treating chamber and the space between a substrate and a transporting chamber. SOLUTION: A substrate housing chamber 40 housing a substrate holding section 62 which transports an untreated substrate and another substrate housing chamber 40b which houses another substrate holding section which transports a treated substrate are housed. Since an air inlet 34 and a air exit 35 are respectively formed through the top and bottom plates of the chamber 30, clean air flows downward in the chamber 30. In addition, a plurality of treating chambers 11 are arranged around the chamber 30 and an intermediate low-pressure section A is formed between the opening 16 of the treating chambers 11 and the substrate exists and entrances 41a and 41b of the substrate housing chambers 40a and 40b. The low-pressure section A is set at a pressure lower than those in the treating chambers 11 and substrate housing chamber 40a and 40b.