发明名称 PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive polymide precursor composition exposable with any of the i-and g-line of a mercury lamp, by incorporating a polymer composed essentially of a specified structural unit and a sensitizer. SOLUTION: This photosensitive polymide precursor composition contains the sensitizer and a polymer having a structural unit represented by the formula, in which R<1> is a 3- or 4-valent acid residue having >=2C atoms; R<2> is a specified aromatic diamine residue or the like; R<3> is -OR<4> , -NHR<4> , or -ON<+> (R<4> R<5> R<6> R<7> ) group; R<4> is a group having at least one kind of ethylenically unsaturated bond; each of R<5> -R<7> is H atom or a 1-10C hydrocarbon group; and (n) 1 or 2. The structural units of the formula have the difference obtained by taking an average electronic affinity of acid dianydride from the average ionization potential of the total diamine components in the range of 6.00-6.20eV.
申请公布号 JPH10246957(A) 申请公布日期 1998.09.14
申请号 JP19970049244 申请日期 1997.03.04
申请人 TORAY IND INC 发明人 TOMIKAWA MASAO;YOSHIMURA TOSHIO;MIURA YASUO
分类号 G03F7/027;C08L79/08;G03F7/038;H01L21/027;H01L21/312;(IPC1-7):G03F7/038 主分类号 G03F7/027
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