| 摘要 |
<p>An electrostatic chuck 20 for holding a substrate 40 in a process chamber 70, comprises a monocrystalline ceramic monolith 25 with an electrode 45 embedded therein for electrostatically holding the substrate 40 upon application of a voltage thereto. The ceramic monolith 25 is made from a single piece of monocrystalline ceramic formed by a melt forming process, or a plurality of monocrystalline ceramic plates 225 bonded to one another. In another embodiment, the invention is directed to an electrostatic chuck comprising a monocrystalline ceramic layer 235 covering a mesh electrode 240 on an underlying dielectric layer 245. An electrical connector 50 extends through the monocrystalline ceramic monolith 25 or the underlying dielectric layer 245 to supply a voltage to the electrode 45. Preferably, the monocrystalline ceramic monolithic structure 25 and the monocrystalline ceramic layer 235 comprise monocrystalline sapphire and the electrodes 45 comprise a refractory metal. Alternative cooling systems are also described. <IMAGE></p> |
