| 摘要 |
PROBLEM TO BE SOLVED: To maintain the expected polishing accuracy on a work extending over a long period of time by preventing a abrasion of a retainer ring of this polishing device head in polishing operations. SOLUTION: A head 4 is provided with a pressure plate 45 for pressing a work 100 to the side of a lower surface plate 1, a chuck holder 44 attached to a peripheral part of this pressure plate 45, and a retainer ring 46 being between the peripheral part of the pressure plate 45 and the chuck holder 44, and its underside is projected more as far as the specified value to the side of the lower surface plate 1 than the surface of the pressure plate 45. In this constitution, at least one side of the chuck holder 44 and the retainer ring 46 is made up of a ceramic material being harder than a polishing pad 1a. |
