| 摘要 |
<p>Decribed are a process for the treatment of liquid residues from photographic processes, in which the residues are oxidized in stages and precipitated solids are then separated out, and in which the residues to be treated are subjected to: (a) oxygen oxidization and (b) oxygen-supported mild anodic oxidization and then (c) ozone oxidization and (d) are freed of precipitated solids by filtration after pH value setting and loading of auxiliary substances and a device for performing this process.</p> |
