发明名称 |
STRUCTURE OF SEMICONDUCTOR SUBSTRATE AND MANUFACTURE OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide an optimum semiconductor substrate that can be used for an intelligent hybrid power IC for a high voltage and large current resistant power device and a peripheral circuit device controlling the power device. SOLUTION: One semiconductor substrate 1 of two semiconductor substrate tightly jointed by their mirror polished face each other has an insulation layer 2 partially on the main surface that is the jointed face. The insulation layer 2 is located rear from the main surface of the semiconductor substrate 1 and the size of the pattern made by the hybrid mounting of the regions the insulated layer 2 and non-insulated layer 2 is made less than about 1mm<2> . |
申请公布号 |
JPH10233351(A) |
申请公布日期 |
1998.09.02 |
申请号 |
JP19970036437 |
申请日期 |
1997.02.20 |
申请人 |
NEC CORP |
发明人 |
KIKUCHI HIROMASA;HAMASHIMA TOMOHIRO |
分类号 |
H01L21/02;H01L21/18;H01L21/762;H01L21/84;H01L23/544;H01L27/12;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|