发明名称 STRUCTURE OF SEMICONDUCTOR SUBSTRATE AND MANUFACTURE OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an optimum semiconductor substrate that can be used for an intelligent hybrid power IC for a high voltage and large current resistant power device and a peripheral circuit device controlling the power device. SOLUTION: One semiconductor substrate 1 of two semiconductor substrate tightly jointed by their mirror polished face each other has an insulation layer 2 partially on the main surface that is the jointed face. The insulation layer 2 is located rear from the main surface of the semiconductor substrate 1 and the size of the pattern made by the hybrid mounting of the regions the insulated layer 2 and non-insulated layer 2 is made less than about 1mm<2> .
申请公布号 JPH10233351(A) 申请公布日期 1998.09.02
申请号 JP19970036437 申请日期 1997.02.20
申请人 NEC CORP 发明人 KIKUCHI HIROMASA;HAMASHIMA TOMOHIRO
分类号 H01L21/02;H01L21/18;H01L21/762;H01L21/84;H01L23/544;H01L27/12;(IPC1-7):H01L21/02 主分类号 H01L21/02
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