POWER SUPPLY DEVICE FOR SPUTTERING AND SPUTTERING DEVICE USING THE SAME

摘要

A power supply device for sputtering which enables improvement in step coverage and improvement in fineness of a sputtering film, by realizing stable sputtering at a voltage not higher than a starting voltage, thereby reducing scattering of sputtering particles due to collision with a sputtering inert gas. The power supply device for sputtering includes a DC power source for sputtering (A), a constant-current circuit (B) connected with the DC power source, a sputtering source (21) connected with the constant-current circuit (B), and a controller (11) for controlling a current outputted from the constant-current circuit (B) to be a constant current.