发明名称 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE MATERIAL, PRODUCTION OF RELIEF PATTERN AND PRODUCTION OF POLYIMIDE PATTERN
摘要 PROBLEM TO BE SOLVED: To obtain a photosensitive compsn. having excellent photosensitive characteristics and storage stability, high resolution and good process stability by incorporating a resorcinol compd., a titanocene compd. and an addition polymerizable compd. having a specified or higher boiling point. SOLUTION: This compsn. contains a resorcinol compd. expressed by formula I, a titanocene compd. expressed by formula II and an addition polymerizable compd. having >=100 deg.C boiling point at normal pressure. Further, the compsn. contains a dye compd. having absorption in 450 to 600nm region. In the formula I, R<1> to R<4> are independently hydrogen atoms, 1 to 5C alkyl groups, phenyl groups, etc., or heterocyclic groups. In the formula II, R<5> to R<14> are independently hydrogen atoms, halogen atoms, 1 to 20C alkoxy groups or heterocyclic groups. Thereby, the obtd. photosensitive compsn. shows excellent photosensitive characteristics and storage stability, high resolution and good process stability.
申请公布号 JPH10228105(A) 申请公布日期 1998.08.25
申请号 JP19970031525 申请日期 1997.02.17
申请人 HITACHI CHEM CO LTD 发明人 KO MASAHIKO;KOJIMA YASUNORI;KAJI MAKOTO
分类号 G03F7/004;C08G73/10;G03F7/008;G03F7/027;G03F7/029;G03F7/038;G03F7/40;H01L21/027;H01L21/312;(IPC1-7):G03F7/029 主分类号 G03F7/004
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