发明名称 |
Method for detecting defects in semiconductor insulators |
摘要 |
The reliability of thin film insulators is determined with noise measurements which find the barrier height mean and standard deviation. A constant voltage source is applied across the thin film insulator. A low noise amplifier is connected across a resistor which is in series with the insulator. A spectrum analyzer is connected to the low noise amplifier. The power density is obtained by observing the output of a spectrum analyzer. The current spectral density is compared to a predetermined reference to detect the presence of defects in the insulator.
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申请公布号 |
US5798649(A) |
申请公布日期 |
1998.08.25 |
申请号 |
US19930109202 |
申请日期 |
1993.08.19 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
SMAYLING, MICHAEL C.;ANSELM, KLAUS A. |
分类号 |
G01R31/01;(IPC1-7):H01H31/12;G01R31/26 |
主分类号 |
G01R31/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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