发明名称 Method for detecting defects in semiconductor insulators
摘要 The reliability of thin film insulators is determined with noise measurements which find the barrier height mean and standard deviation. A constant voltage source is applied across the thin film insulator. A low noise amplifier is connected across a resistor which is in series with the insulator. A spectrum analyzer is connected to the low noise amplifier. The power density is obtained by observing the output of a spectrum analyzer. The current spectral density is compared to a predetermined reference to detect the presence of defects in the insulator.
申请公布号 US5798649(A) 申请公布日期 1998.08.25
申请号 US19930109202 申请日期 1993.08.19
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 SMAYLING, MICHAEL C.;ANSELM, KLAUS A.
分类号 G01R31/01;(IPC1-7):H01H31/12;G01R31/26 主分类号 G01R31/01
代理机构 代理人
主权项
地址
您可能感兴趣的专利