发明名称 RADIATION SENSITIVE POSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a radiation sensitive positive resin composition high in sensitivity and resolution and hood in profiles and superior in heat resistance and file endurance and storage stability. SOLUTION: This resin composition contains a novolak resin substituted by 1,2-naphthoquinonediazidosulfonyl ester for H in an amount of 0.03-0.27mol/ mol of H atom and having a weight average molecular weight in terms of polystyrene and repeating units represented by the formula (m) is 0, 1, 2, or 3}, and it is dissolved in a mixed solvent comprising a lactate ester and acetate ester in a weight ratio of 95:5-30:70.
申请公布号 JPH10221847(A) 申请公布日期 1998.08.21
申请号 JP19970040164 申请日期 1997.02.07
申请人 SHIN ETSU CHEM CO LTD 发明人 FURUHATA TOMOYOSHI;OKAZAKI SATOSHI
分类号 G03F7/004;G03F7/023;H01L21/027;(IPC1-7):G03F7/023 主分类号 G03F7/004
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