摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive positive resin composition high in sensitivity and resolution and hood in profiles and superior in heat resistance and file endurance and storage stability. SOLUTION: This resin composition contains a novolak resin substituted by 1,2-naphthoquinonediazidosulfonyl ester for H in an amount of 0.03-0.27mol/ mol of H atom and having a weight average molecular weight in terms of polystyrene and repeating units represented by the formula (m) is 0, 1, 2, or 3}, and it is dissolved in a mixed solvent comprising a lactate ester and acetate ester in a weight ratio of 95:5-30:70. |