发明名称 X-ray mask structure for reducing the distortion of a mask
摘要 A X-ray mask structure which reduces the distortion of the membrane, the X-ray mask structure including, a mask substrate having an opening in the central part thereof, a membrane formed on the mask substrate, the membrane having the chip site on which absorbers are arranged according to a desired pattern of a semiconductor device, and a support ring for supporting the mask substrate, which is defined by a plurality of fragments.
申请公布号 US5796804(A) 申请公布日期 1998.08.18
申请号 US19970794906 申请日期 1997.02.04
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 JEON, YOUNG JIN;CHOI, SANG SOO;CHUNG, HAI BIN;LEE, JONG HYUN;YOO, HYUNG JOUN
分类号 G03F1/14;G03F7/20;G21K1/10;(IPC1-7):G21K5/08 主分类号 G03F1/14
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