发明名称 |
X-ray mask structure for reducing the distortion of a mask |
摘要 |
A X-ray mask structure which reduces the distortion of the membrane, the X-ray mask structure including, a mask substrate having an opening in the central part thereof, a membrane formed on the mask substrate, the membrane having the chip site on which absorbers are arranged according to a desired pattern of a semiconductor device, and a support ring for supporting the mask substrate, which is defined by a plurality of fragments.
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申请公布号 |
US5796804(A) |
申请公布日期 |
1998.08.18 |
申请号 |
US19970794906 |
申请日期 |
1997.02.04 |
申请人 |
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
JEON, YOUNG JIN;CHOI, SANG SOO;CHUNG, HAI BIN;LEE, JONG HYUN;YOO, HYUNG JOUN |
分类号 |
G03F1/14;G03F7/20;G21K1/10;(IPC1-7):G21K5/08 |
主分类号 |
G03F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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