| 摘要 |
The present invention relates to a method of patterning metallic building elements, and also to a metallic building element, where the measuring accuracy achieved can lie in the sub-micrometer range. Starting from a silicon master or original that can be etched to sub-micrometer precision and then plated with a metal, such as nickel ( 3 ), on the silicon surface, there can be produced a nickel shim where precision and surface fineness can lie in the sub-micrometer range. Subsequent to removal of the silicon master, a photo-sensitive material ( 5 ) can be used in liquid form or in film form to create mould cavities ( 9 ) that reach down to the nickel shim. These cavities can then be metal-plated to provide a building element ( 8 ) of higher precision in three dimensions. |
