Einrichtung zum Justieren einer Photomaske auf einer mit Photolack ueberzogenen Platte,申请号DED1521780-传众专利搜索

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发明名称	Einrichtung zum Justieren einer Photomaske auf einer mit Photolack ueberzogenen Platte
摘要
申请公布号	DE1521780(B)	申请公布日期	1970.01.22
申请号	DED1521780	申请日期	1963.06.20
申请人	DEUTSCHE ITT INDUSTRIES GMBH	发明人	STEINHART,FRIEDRICH
分类号	G03F7/20;H01L21/68	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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