发明名称 |
Gas distribution for CVD systems |
摘要 |
A substrate processing system including a vacuum chamber; a pedestal which holds a substrate during processing; and a gas distribution structure which during processing is located adjacent to and distributes a process gas onto a surface of the substrate that is held on the pedestal for processing. The gas distribution structure includes a gas distribution faceplate including a plurality of gas distribution holes formed therethrough, wherein the holes of at least a first set of the plurality of holes pass through the faceplate at angles other than perpendicular to the surface of substrate.
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申请公布号 |
US5792269(A) |
申请公布日期 |
1998.08.11 |
申请号 |
US19950550668 |
申请日期 |
1995.10.31 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
DEACON, THOMAS E.;CHEUNG, DAVID;LEE, PETER WAI-MAN;HUANG, JUDY H. |
分类号 |
C23C16/44;C23C16/455;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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