发明名称 |
System for supplying high-pressure medium gas |
摘要 |
The present invention provides a system for supplying a high-pressure medium gas suitable for processing a semiconductor to be processed by heating under isostatic pressure in a short cycle. The system includes a gas holder containing a high-pressure medium gas, a compressor for pressurizing the high-pressure medium gas supplied from the gas holder, a high-pressure vessel having a heater, an accumulator for storing the high-pressure medium gas pressurized by the compressor, a first evacuation unit for evacuating the inside of a pipeline for the high-pressure medium gas, a vacuum casing for holding the opening of the high-pressure vessel in a vacuum, a second evacuation unit for evacuating the inside of the vacuum casing, and a valve unit for connecting the high-pressure vessel and the accumulator so that series connection and parallel connection can be switched on the outlet side of the compressor. |
申请公布号 |
US5792271(A) |
申请公布日期 |
1998.08.11 |
申请号 |
US19970845821 |
申请日期 |
1997.04.28 |
申请人 |
KABUSHIKI KAISHA KOBE SEIKO SHO;NIHON SHINKU GIJUTSU KABUSHIKI KAISHA |
发明人 |
FUJIKAWA, TAKAO;ISHII, TAKAHIKO;NAKAI, TOMOMITSU;SAKASHITA, YOSHIHIKO |
分类号 |
F27B17/00;B01J3/02;B01J4/00;F17C7/00;H01L23/02;(IPC1-7):C23C14/80 |
主分类号 |
F27B17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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