| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam pattern writing apparatus operating at a high throughput, without deterioration the pattern writing accuracy. SOLUTION: The apparatus comprises a pattern contour width recognizer 1 for recognizing the contour width of a pattern 5 from design data, a pattern interior data creator 2 for creating pattern interior data representing the pattern interior with a max. grid in a range not influencing the pattern edges, based on the pattern contour width, a pattern edge data creator 3 for creating pattern edge data representing the pattern edges with fine grids, based on the pattern contour width and a pattern plotter 4 for drawing the pattern 5, using the pattern interior data and edge data. |
