发明名称 THIN FILM TRANSISTOR FERROELECTRIC RANDOM ACCESS MEMORY AND ITS MANUFACTURE
摘要 PROBLEM TO BE SOLVED: To provide a highly integrated FRAM in a simple structure. SOLUTION: A plurality of TFTs are arranged on the upper part of a ferroelectric capacitor which is provided with respectively and integrally formed lower electrode 1 and a ferroelectric layer 2 and a plurality of upper electrodes 3. The plurality of TFTs are provided respectively corresponding to the upper electrodes 3. Insulator layers 4a are further provided on the upper electrodes 3 so as to leave windows for bringing the TFTs into contact with the upper electrodes 3 to form the TFTs on the insulator layers 4a and exposed upper electrodes 3. Besides, ground pads are formed between the plurality of upper electrodes 3 on the ferroelectric layer 2 to discharge the charge generated by the pyroelectric effect on the surface of the ferroelectric layer. In such a constitution, it is recommended that the lower and upper electrodes 1, 3 are formed of ceramics especially RuOx.
申请公布号 JPH10209388(A) 申请公布日期 1998.08.07
申请号 JP19970351577 申请日期 1997.12.19
申请人 SAMSUNG ELECTRON CO LTD 发明人 RYU INKEI;TEI ICHISHO
分类号 H01L21/8247;H01L21/8242;H01L21/8246;H01L27/10;H01L27/105;H01L27/108;H01L29/786;H01L29/788;H01L29/792 主分类号 H01L21/8247
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