| 摘要 |
<p>A method and apparatus for producing extreme ultra-violet light comprising a nozzle (10) for flowing a gas at a supersonic velocity, a source for directing a radiated energy beam (23) into the flowing gas to stimulate emission of extreme ultra-violet light (27) therefrom, and a diffuser (12) for capturing a substantial portion of the gas so as to mitigate contamination caused thereby. The extreme ultra-violet light so produced is suitable for use in photolithography for integrated circuit fabrication and the like.</p> |
