发明名称 POLISHING END POINT DETECTING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a polishing end point detecting method capable of detecting the polishing end point with high sensitivity and stability through a simplified method. SOLUTION: With regard to a polishing method of polishing a polishing object to a flat and mirrorlike surface by pressing a top ring 13 retaining the polishing object against a polishing cloth 11 stuck to a rotating turntable 12 and rotating the turntable 12 together with the top ring 13, variation of the polishing resisting force produced when polishing of the polishing object reaches a dissimilar material, or variation of the polishing resistance force produced when unevenness is removed at the time of flattening the surface unevenness is detected by the variation of electric power W inputted in the turnatable 12 or the top ring 13 drive motors 15, 16.
申请公布号 JPH10202523(A) 申请公布日期 1998.08.04
申请号 JP19970023135 申请日期 1997.01.22
申请人 EBARA CORP 发明人 SAKATA FUMIHIKO
分类号 B24B49/16;B24B37/013;H01L21/304 主分类号 B24B49/16
代理机构 代理人
主权项
地址