发明名称 METHOD OF GROWING CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method of growing crystal, whereby the flatness is enhanced and film thickness and compsn. ratio are controlled with high accuracy. SOLUTION: A II and VI elements are fed to grow a crystal layer of a II-VI compd. semiconductor by the MBE method, comprising a step 1 of feeding a II element and then a VI element with an interruption time and allowing another interruption time to grow a crystal layer of 0.5ML or less, and a step 2 of feeding the II element and then the IV element with an interruption time and allowing another interruption time to grow a crystal layer of 0.5ML or more, thereby forming a crystal layer of 1ML, together with the step 1. Thus a crystal is grown two-dimensionally.
申请公布号 JPH10199898(A) 申请公布日期 1998.07.31
申请号 JP19970011816 申请日期 1997.01.06
申请人 SONY CORP 发明人 TSUKAMOTO HIRONORI;KATOU GOUSAKU;NOGUCHI HIROYASU
分类号 H01L21/203;H01L21/363;H01L33/06;H01L33/12;H01L33/28;H01S5/00 主分类号 H01L21/203
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