发明名称 Inrichting voor het behandelen van halfgeleiderschijven.
摘要 Device for processing semiconductor wafers, comprising at least one processing chamber which is completely closed with the exception of a connection to a distribution. System. In said at least one processing chamber there are situated preferably two reactors and a common feed/removal system in order to be able to subject wafers, which may optionally be arranged in boats, to an identical processing operation.
申请公布号 NL1005102(C2) 申请公布日期 1998.07.29
申请号 NL19971005102 申请日期 1997.01.27
申请人 ADVANCED SEMICONDUCTOR MATERIALS INTERNATIONAL N.V. 发明人 ERNST HENDRIK AUGUST GRANNEMAN;ALBERT HASPER;JAN ZINGER
分类号 H01L21/302;B65G49/07;H01L21/205;H01L21/31;H01L21/324;H01L21/677;(IPC1-7):H01L21/00 主分类号 H01L21/302
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