发明名称 |
Inrichting voor het behandelen van halfgeleiderschijven. |
摘要 |
Device for processing semiconductor wafers, comprising at least one processing chamber which is completely closed with the exception of a connection to a distribution. System. In said at least one processing chamber there are situated preferably two reactors and a common feed/removal system in order to be able to subject wafers, which may optionally be arranged in boats, to an identical processing operation. |
申请公布号 |
NL1005102(C2) |
申请公布日期 |
1998.07.29 |
申请号 |
NL19971005102 |
申请日期 |
1997.01.27 |
申请人 |
ADVANCED SEMICONDUCTOR MATERIALS INTERNATIONAL N.V. |
发明人 |
ERNST HENDRIK AUGUST GRANNEMAN;ALBERT HASPER;JAN ZINGER |
分类号 |
H01L21/302;B65G49/07;H01L21/205;H01L21/31;H01L21/324;H01L21/677;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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