发明名称 THIN FILM DEVICE HAVING COATING FILM, LIQUID CRYSTAL PANEL, ELECTRONIC APPARATUS AND METHOD OF MANUFACTURING THE THIN FILM DEVICE
摘要 <p>Any one of an insulating film forming a TFT, a silicon film and a conductive film is formed by applying a solution and annealing it. In a spin coater (102), a coating solution containing a thin film component which is supplied from a solution storage section (105) is spin-coated onto a substrate. The substrate after coating the coating solution is annealed in an annealing section (103) to form a coating film on the substrate. Additional laser annealing improves one of film characteristics, i.e., crystallinity, compactness and adhesiveness. Application of the coating solution or a resist by an ink jet process increases utilization of the solution and permits forming a patterned coating film. Since a thin film device in accordance with the present invention is inexpensive and has a high throughput, TFT production by a production system having high utilization of the coating solution drastically reduces initial investment and production cost of a liquid crystal display device. <IMAGE></p>
申请公布号 EP0855614(A1) 申请公布日期 1998.07.29
申请号 EP19970922043 申请日期 1997.05.14
申请人 SEIKO EPSON CORPORATION 发明人 YUDASAKA, ICHIO;SHIMODA, TATSUYA;KANBE, SADAO;MIYAZAWA, WAKAO
分类号 G02F1/1368;G02F1/1333;G02F1/1362;H01L21/20;H01L21/205;H01L21/225;H01L21/288;H01L21/31;H01L21/3205;H01L21/336;H01L21/768;H01L21/77;H01L21/84;H01L27/12;H01L29/786;(IPC1-7):G02F1/136;G02F1/133;C01G19/00;G02F1/134;B05C5/00 主分类号 G02F1/1368
代理机构 代理人
主权项
地址