发明名称 TREATMENT OF GAS CONTAINING ORGANIC HALOGEN COMPOUND AND APPARATUS THEREFOR
摘要 <p>PROBLEM TO BE SOLVED: To treat gas containing an organic halogen compound at a low cost and with low energy by a method in which the gas is irradiated with electron beams to decompose the halogen compound. SOLUTION: In the treatment of gas 10 containing an organic halogen compound such as trichloroethylene, an electron beam irradiation apparatus 2 is actuated, electron beams 11 are emitted in a treatment container 1, and the gas is supplied from an inflow port 1a into the container 1. The gas 10 is irradiated with the electron beams 11 to be treated by the decomposition of the halogen compound and discharged from an outflow opening 1b. In other words, the halogen compound is irradiated with the electron beams 11 having greater energy than the interatomic bond energy of the molecule so that the interatomic bond is cut to decompose the molecule. Besides, radicals are generated from the atmospheric gas of the halogen compound by the electron beams 11, and the decomposition of the halogen compound is accelerated by the radicals.</p>
申请公布号 JPH10192652(A) 申请公布日期 1998.07.28
申请号 JP19970003523 申请日期 1997.01.13
申请人 MITSUBISHI HEAVY IND LTD 发明人 NAKAYA JIYUNNOSUKE
分类号 B01D53/34;B01D53/32;B01D53/70;(IPC1-7):B01D53/70 主分类号 B01D53/34
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