发明名称 SILICIUM- ODER SILICIUMDIOXID-SUBSTRAT MIT MODIFIZIERTER OBERFLÄCHE UND VERFAHREN ZU DESSEN HERSTELLUNG
摘要 PCT No. PCT/CH93/00173 Sec. 371 Date May 19, 1994 Sec. 102(e) Date May 19, 1994 PCT Filed Jul. 6, 1993 PCT Pub. No. WO94/02425 PCT Pub. Date Feb. 3, 1994The silicon or silica substrates described have a modified surface of a new type occupied by the alcohol fraction of an orthoester. The alcohol fraction may be saturated or unsaturated. The surface of the substrate is modified by being treated with an orthoester, the water being eliminated from the surface by hydrolysis and then replaced by the resulting alcohol or silylether. Besides many other compounds, new orthoesters having the formula R1C[OCH2-CH2-O-CO-CH=CH2]3, in which R1 stands for hydrogen or for a clearable organic residue, R stands for (CH2)n, in which n stands for an integer between 1 and 18, and new orthoesters having the formula (I), are particularly appropriate. In the formula (I), R1 stands for hydrogen or an organic residue, R3 stands for hydrogen or an alkyl group with 1 to 6 carbon atoms; and R4 stands for hydrogen, an alkyl group or an alkyl group or a phenyl group. The modified surfaces have a larger wetting or contact angle, and thus a reduced wettability. In addition, they are capable of reacting with other monomers or polymers by means of all sorts of reactive substituents. This kind of surface modification advantageously replaces the silanization which was up to now usual for glass and other silicates.
申请公布号 AT167462(T) 申请公布日期 1998.07.15
申请号 AT19930912542T 申请日期 1993.07.06
申请人 OWENS CORNING 发明人 GUIDOTTI, BRUNO;CASERI, WALTER;SUTER, URLRICH, W.;SAUR, WOLFGANG
分类号 C01B33/02;C01B33/12;C03C17/28;C03C17/34;C04B20/10;C04B41/45;C04B41/46;C04B41/81;C07C69/54;C07D303/12;C07D303/22;H01L21/20;H01L21/306;H01L21/312;H01L23/14;(IPC1-7):C03C17/28 主分类号 C01B33/02
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