发明名称 PRODUCTION OF PHOSPHOR PATTERN
摘要 PROBLEM TO BE SOLVED: To make it possible to form phosphor patterns of shapes having excellent uniformity and symmetricalness with high accuracy by packing positive photosensitive resin compsn. layers into the discharge spaces of a substrate for a plasma display panel formed with barrier ribs. SOLUTION: The positive photosensitive resin compsn. layers C5 are packed into the discharge spaces of the substrate for the plasma display panel formed with the barrier ribs. The positive photosensitive resin compsn. layers C5 are irradiated imagewise with active rays and the irradiated parts thereof are removed by development. A negative photosensitive resin compsn. layer A7 contg. the phosphors and a thermoplastic resin layer B6 are thermally press bonded onto the substrate for the plasma display panel from which the positive type photosensitive resin compsn. layers C5 are removed only in the desired parts by disposing the A layer 7 on the substrate side. These layers are irradiated imagewise with the active layers. The unnecessary parts of the theremally press bonded A layer 7 and B layer 6 are removed by development. The multicolor patterns consisting of the photosensitive resin compsn. contg. the phosphors developing red, green and blue are formed by repeating these stages. The unnecessary pads are removed by baking.
申请公布号 JPH10186643(A) 申请公布日期 1998.07.14
申请号 JP19960349250 申请日期 1996.12.27
申请人 HITACHI CHEM CO LTD 发明人 TACHIKI HIDEYASU;NOJIRI TAKESHI;TANAKA HIROYUKI;WADA YUMIKO;TAI SEIJI
分类号 G03F7/004;B32B7/02;C09K11/00;G03F7/027;G03F7/038;G03F7/039;G03F7/11;G03F7/40;H01J9/227;(IPC1-7):G03F7/004 主分类号 G03F7/004
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