| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing device capable of dressing its abrasive cloth in its initial state of accepting a workpiece or in its process of polishing a workpiece such that the cloth has the same improved flatness over the surface. SOLUTION: A stationary plate 7 adapted to be rotated has an abrasive cloth 8 stuck on its surface. A polisher head 3 arranged above the stationary plate 7 holds a workpiece opposite thereto. A dresser head 11 arranged also above the stationary plate 7 is used to dress the surface of the abrasive cloth 8 fixed on the stationary plate 7. A surface-outline observing means 6 fixes the abrasive cloth 8 on the stationary plate 7 to observe its surface outline. The abrasive cloth 8 may be dressed by, for example, controlling the rotating speeds of the stationary plate 7 and the dresser head 11. |
