Apparatus and method for wet cleaning or etching of flat substrates

摘要

An apparatus (1) for wet cleaning or etching of flat substrates (9) comprising a tank (3) with an inlet opening (5) and outlet opening (7) for substrates. Said tank containing cleaning liquid (11) and being installed in an environment (13). At least one of the openings is a slice in a sidewall of the tank present below the liquid-surface (15) and being marginally larger than the thickness of said substrates. In the tank (3) there may be a portion (25) above the liquid (11) filled with a gas with a pressure being lower than the pressure within said environment (13). The method comprises the step of transferring a substrate through the cleaning or etching liquid at a level underneath the liquid surface making use of said apparatus. <IMAGE>