| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a sputtering target capable of producing low resistance wire film suitable for a display for liq. crystals. SOLUTION: In a sputtering target used for a thin film deposition method in which a sputtering phenomenon by glow discharge is utilized, the sputtering target is essentially consisting of metallic chromium and metallic molybdenum, and the content of oxygen therein is regulated to <=200ppm. Furthermore, the compositional ratio of the metallic molybdenum to the metallic chromium is set to the range of 20 to 80wt.%. Moreover, as the metallic chromium, the one obtd. by solidifying metallic chromium powder large in grain size is used, and, as the metallic molybdenum, the dissolved material of metallic molybdenum is used.</p> |
