发明名称 Semiconductor integrated circuit device
摘要 A nonvolatile storage element of single-layer gate structure constructed by arranging a floating gate formed of a conductive layer to partly overlap with a control gate formed of a diffused layer is provided with a barrier layer covering a part or the whole of the surface of the floating gate. Such nonvolatile storage elements are used for redundancy control of defects or change of functions.
申请公布号 US5767544(A) 申请公布日期 1998.06.16
申请号 US19950470459 申请日期 1995.06.06
申请人 HITACHI, LTD.;HITACHI VLSI ENGINEERING CORP. 发明人 KURODA, KENICHI;TAKEDA, TOSHIFUMI;MORIUCHI, HISAHIRO;SHIRAI, MASAKI;SAKAGUCHI, JIROH;MATSUO, AKINORI;YOSHIDA, SHOJI
分类号 H01L21/8247;H01L27/10;H01L27/105;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):G11C7/00 主分类号 H01L21/8247
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