| 摘要 |
Apparatus for cleaning a wafer carrying cassette. The cassette is fabricated as open top box having closed sides and a plurality of grooves formed in its interior that each hold a wafer. The apparatus includes an enclosure having an entry and an exit, and a conveyor is provided for transporting the cassette through the enclosure. A first plurality of jet spray nozzles are disposed adjacent to the entry that produce a carbon dioxide jet spray that cleans exterior surfaces of the cassette as it travels through the entry. A blower produces a flow of air through the enclosure and a filter filters the air flowing through the enclosure. A second plurality of moveable jet spray nozzles is controlled to move into the interior of the cassette to generate a carbon dioxide spray that cleans the interior of the cassette. An electrostatic control system is provided that controls buildup of electrostatic charge on the cassette caused by the carbon dioxide spray. Heaters control the temperature of the cassette at or above room temperature to prevent condensation.
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