CERAMIC DENSE FILM AND ITS PRODUCTION

摘要

PROBLEM TO BE SOLVED: To efficiently densify a film and to form a high density ceramic thin film by a sol-gel process on a substrate having low heat resistance by changing part of energy required to densify a film from heat energy to light energy. SOLUTION: The top of a substrate having heat resistance at <=250 deg.C is coated with a sol and irradiated with light to form the objective ceramic dense thin film having >=1.90g/cm<3> density. The wavelength of the light is shorter than 300nm at which the formed film has absorption. The ceramic dense thin film is corroded at <=70Å/min rate by 0.1vol.% hydrofluoric acid. The ceramic is, e.g. SiO2 . When heat treatment is carried out during the irradiation with light, densification proceeds further, density increases and the dense thin film can be formed on an org. substrate.