| 摘要 |
<p>A method of inspecting a lens (16) includes projecting a first amount of radiation through a first test pattern (42, 44) and the lens to provide a first lens error associated with a first heating of the lens, projecting a second amount of radiation through a second test pattern (52, 54) and the lens to provide a second lens error associated with a second heating of the lens, and using the first and second lens errors to provide image displacement data that varies as a function of heating the lens. In this manner, corrections can be made for localized lens heating that is unique to a given reticle. The method is well-suited for photolithographic systems such as step and repeat systems.</p> |
