摘要 |
A method of treating a substrate for an electrophotographic photosensitive member by a process comprises the steps of; a) cutting the surface of the substrate to remove the surface in the desired thickness; and b) bringing the cut surface of the substrate into contact with water having a temperature of from 5 DEG C to 90 DEG C, having a resistivity of not less than 11 M OMEGA .cm at 25 DEG C, containing fine particles with a particle diameter of not smaller than 0.2 mu m in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for at least 10 seconds at a pressure of from 1 kg.f/cm<2> to 300 kg.f/cm<2>. <IMAGE> |
申请人 |
CANON K.K., TOKIO/TOKYO, JP |
发明人 |
TAKEI, TETSUYA, C/O CANON KABUSHIKI KAISHA, OHTA-KU, TOKYO 146, JP;OHTOSHI, HIROKAZU, C/O CANON KABUSHIKI KAISH, OHTA-KU, TOKYO 146, JP;OKAMURA, RYUJI, C/O CANON KABUSHIKI KAISHA, OHTA-KU, TOKYO 146, JP;KATAGIRI, HIROYUKI, C/O CANON KABUSHIKI KAISH, OHTA-KU, TOKYO 146, JP;TAKAI, YASUYOSHI, C/O CANON KABUSHIKI KAISHA, OHTA-KU, TOKYO 146, JP |