发明名称 Method of selectively removing a metallic layer from a non-metallic substrate
摘要 A method of selectively removing a metallic layer (3) from a non-metallic substrate (1) includes the steps of arranging for the metallic layer (3) to be overlaid by a coating (7) of Sn-rich metallic material, and directing a laser beam of wavelength lambda onto a selected area (5') of the coating (7), lambda being chosen to lie in the range 450-650 nm, thereby causing localized heating of the coating (7) in this area (5') and consequent ablative removal of the underlying portion of the metallic layer (3). The method is particularly useful in the manufacture of printed circuit boards.
申请公布号 US5759416(A) 申请公布日期 1998.06.02
申请号 US19960754341 申请日期 1996.11.22
申请人 U.S. PHILIPS CORPORATION 发明人 BOSMAN, JOHAN;VAN DOOREN, JOHANNES P. C.
分类号 B23K26/00;B23K26/36;C23F1/02;C23F4/00;H05K3/02;H05K3/06;(IPC1-7):B44C1/22;C23F1/00 主分类号 B23K26/00
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