| 摘要 |
PURPOSE:To measure both EXAFS and XANES continuously by one apparatus by changing the energy resolution, crystal fixing/holding time and energy step width in correspondence to the angle of spectral crystal. CONSTITUTION:A measuring section is set as a measuring condition via an operating device 25. As for the fixing/holding time of crystal, the length is automatically changed and set by a control device 24 from the relation with the receiving slit width. Then, the energy step width is determined within each measuring section. In other words, an angle theta of a spectral crystal 9 is fixed to an angle theta1 for a predetermined time, and during this time an intensity Io of the X ray incident upon a sample 11 and an intensity I of the penetrating X ray are detected. The ratio of intensity Io/I is calculated by a measuring instrument 26. The result is plotted. After one plot is finished, the angle theta of the spectral crystal 9 is changed to an angle theta 2 and the ratio Io/I is obtained and plotted on a diagram. In this manner, both EXAFS and XANES are mea sured continuously by one apparatus by repeating the above procedure. |
