| 摘要 |
PROBLEM TO BE SOLVED: To enable the formation of high-contrast images by forming plural dotty electrodes on the Schotkky junction layers on both surfaces of a photoconductor layer consisting of amorphous silicon and laminating the light reflection layers consisting of an insulating layer forming a specific smooth reflection surface on the insulating layer contacting with the photoconductor layer. SOLUTION: Transparent electrodes 52a, 52b are formed on glass substrates 51a, 51b and the photoconductor layer 53 consisting of amorphous silicon hydride (a-Si:H) is formed on the transparent electrode 52b. An SnO2 film formed thereon is etched to form electrodes 19 over the entire surface of a plotting area, by which the dotty Schotkky junction layers are formed. Multilayered films of silicon/silicon oxide are thereafter, formed as a dielectric mirror 54 having a smooth reflection surface of uniform reflectivity at the boundary reverse from the photoconductor layer 53. Polyimide films are formed as oriented films 55a, 55b and are then subjected to molecule orientation treatments by rubbing. The glass substrates 51a, 51b are stuck to each other via spacers 56 and a nematic liquid crystal mixture is injected therebetween, by which a liquid crystal layer 57 is formed. |
