| 摘要 |
PROBLEM TO BE SOLVED: To provide the composition capable of suppressing the occurrence of scum, improved in developing property, high in sensitivity and excellent in heat resistance and residual film ratio by incorporating a specific alkali soluble resin and a specific 1,2-quinone diazide compound into the composition. SOLUTION: This radiation resin composition containing the alkali soluble resin having weight average molecular weight of 2000-20000 expressed in terms of polystyrene and the 1,2-quinone diazide compound expressed by formula is used. In the formula, P represents integers of 0 or 1, D represents hydroxide group or an organic group having 1,2-quinone diazide group and a part or the whole of D is the organic group having 1,2-quinone diazide group. Various blending agents such as a sensitizer, a surfactant, a dissolution accelerating agent can be added in the composition. A dye or a pigment can be added to the composition in order to visualize a latent image in a part irradiated with radiation and reduce the effect of halation at the time of irradiation of radiant ray, and an adhesive assistant can be added in order to improve adhesion. |
