| 摘要 |
PROBLEM TO BE SOLVED: To provide an X-ray mask blank as the material of an X-ray mask which can transfer a pattern with high precision, a manufacturing method of the mask blank, and an X-ray mask. SOLUTION: In an X-ray mask blank 2, having an X-ray transmitting film 1 formed on a silicon substrate 11 and an X-ray absorbing film 13 formed on the film 1, the product of the stress of the X-ray absorbing film 13 and the film thickness at a plurality of points in a previously determined region is 0-±5×10<3> dyn/cm. To manufactured to the X-ray mask blank 2, the stress distribution and/or the film thickness distribution of the X-ray absorbing film 13 are controlled in a process for forming the X-ray absorbing film. Thereby the X-ray absorbing film 13, wherein the product of the stress of the X-ray absorbing film 13 and the film thickness at a plurality of the points in the previously determined region is 0-±5×10<3> dyn/cm is formed. |
