TECHNIQUE FOR MANUFACTURING INTEGRATED OPTICS DEVICES

摘要

The present disclosure describes a method for fabrication of integrated optic wa veguide devices utilizing photosensitive material on a variety of substrate materials. T he method comprises the steps of a) making a sample that consists of a slab layer o n a substrate; and b) depositing a thin layer of photosensitive material on the samp le; and c) placing a photolithography mask, having an opening corresponding to an optica l component, device circuit layout, on the photosensitive layer after the step (b) ; and d) exposing the sample with ultraviolet light to increase the refractive index of t he photosensitive materials in the opening regions of the mask, and e) removing the mask. The desired integrated optic component, device or circuit is formed in the slab layer due to an increase in the refractive index of the photosensitive layer on its top.