| 摘要 |
PROBLEM TO BE SOLVED: To enhance the sensitivity, to ensure a high resolving power and to form a superior resist pattern by using a specified compd. generating solfonic acid and an org. basic compd. in a specified ratio. SOLUTION: This photosensitive compsn. contains an org. basic compd., a compd. represented by formula I or II and generating sulfonic acid when irradiated with active light or radiation and a resin having groups which are decomposed by the action of the acid and increase solubility in an alkali developer. The molar ratio of the compd. represented by the formula I or II to the org. basic compd. is 2.5-30.0. In the formulae I, II, each of R1 -R5 is H, an alkyl, etc., R6 is an alkyl or aryl and X<-> is benzenesulfonic acid, naphthalenesulfonic acid, etc., having one or more groups such as a branched or cyclic 8C alkyl and alkoxy. |
