发明名称 |
Method for electron beam deposition of multicomponent evaporants |
摘要 |
A method for the electron beam deposition of a multicomponent evaporant to ensure a consistent layer quality with constant composition and thickness in a defined manner. The X-radiation emitted from the evaporant on the point of electron beam impingement is measured in situ, using the obtained signal as reference input to control the parameters of the evaporation process and therefore to control the deposition rate and material composition of the deposited layer. The method is used for the production of corrosion resistant, high-temperature resistant, hard-wearing or optical layers on, for example, strip steel or plastic film.
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申请公布号 |
US5750185(A) |
申请公布日期 |
1998.05.12 |
申请号 |
US19960638393 |
申请日期 |
1996.04.29 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. |
发明人 |
GOEDICKE, KLAUS;METZNER, CHRISTOPH;KIRCHHOFF, VOLKER;HEMPEL, WOLFGANG;SCHILLER, NICOLAS |
分类号 |
C23C14/30;C23C14/54;H01J37/304;H01J37/305;(IPC1-7):B05D3/06 |
主分类号 |
C23C14/30 |
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