| 摘要 |
<p>A charged liquid is guided of the outgoing resource to the destination, while an excessive quantity of this liquid is applied, minimum 0,1 percent, suitable 5 up to 50 percent, over the requested charged quantity. A continual liquid overflow is being set related to the change of the hydrostatic pressure or related to the change in a planar overflow of this liquid. A liquid excess is outgoing to the basic liquid resource. The equipment consists of the first container (1) at least, and of the second container (2) connected to the lower pipe (6) and upper pipe (8), while the first container (1) equipped with the inlet pipe (3), with the outlet pipe (5) and with the opened pipe (4), able to be extended in the inlet. The second reservoir (2) is equipped with the outlet pipe (10), while the connection with the extended end is suitable, and this connection is provided via the reduction (7) with the lower pipe (8).</p> |
