| 摘要 |
<p>The process commences with an orientated silica substratum (20) which is engraved using sodium hydroxide. The silica substratum forms cavities (32,34) with sides at 55 degrees to the horizontal under engraving and an insulating layer is then formed by thermal oxidation. A magnetic layer is then deposited into the cavities (32,34) electrolytically and more than fills them. The excess is removed by polishing to expose again the central insulating layer. Magnetic layers (36,38) are deposited on the flux guides (32,34) and finally the magnetoresistive element (40) is added to overlap the magnetic layers (36,38).</p> |
