发明名称 Product of vapor deposition and method of manufacturing same
摘要 PCT No. PCT/JP94/01379 Sec. 371 Date Apr. 18, 1996 Sec. 102(e) Date Apr. 18, 1996 PCT Filed Aug. 22, 1994 PCT Pub. No. WO96/06216 PCT Pub. Date Feb. 29, 1996Disclosed is a product of vapor deposition comprising a vapor deposited thin film formed on a surface of an organic substrate through an intermediate agent which includes at least a silicone resin and silicon dioxide, and a method for manufacturing a product of vapor deposition, in which the silicon dioxide is produced by plasma treatment. Accordingly, the vapor deposition thin film is significantly improved in an adhesive strength to provide the product of vapor deposition with an excellent washing resistance and abrasion resistance.
申请公布号 US5744405(A) 申请公布日期 1998.04.28
申请号 US19960633807 申请日期 1996.04.18
申请人 TORAY INDUSTRIES, INC. 发明人 OKUMURA, JIICHIRO;NEGISHI, TAKAO
分类号 C23C14/00;C23C14/08;C23C14/20;D06M10/02;D06M10/04;D06M10/10;D06M11/79;D06M11/83;D06M15/643;D06M17/00;D06M23/00;(IPC1-7):B32B9/04 主分类号 C23C14/00
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