发明名称 METHOD FOR ANALYZING SOLID SOLUTION LAYER IN MULTILAYERED FILM
摘要 <p>PROBLEM TO BE SOLVED: To easily and accurately calculate a solid soln. ratio by preliminarily forming a calibration curve from the corresponding relation of the solid soln. ratio measured by an X-ray diffraction method and a peak waveform due to X-ray photoelectron spectroscopy and measuring the peak waveform due to the X-ray photoelectron spectroscopy to calculate the solid soln. ratio on the basis of the calibration curve. SOLUTION: A peak waveform is measured to the solid soln. layer in a multilayered film by X-ray photoelectron spectroscopy and processing decomposing the peak waveform into a Gauss-Laurence function is performed by an electronic calculator. Separation waveforms correspond to TiC and TiN. The area ratio of the separation waveform corresponding to TiN and that corresponding to TiC is calculated. There is a good linear relation between this area ratio and the solid soln. ratio calculated by an X-ray diffraction method. A calibration curve is prellminarily formed on the basis of the area ratio of the separation waveform corresponding to TiN and that corresponding to TiC. The peak waveform is measured by the X-ray photoelectron spectroscopy and the area ratio of the separation waveforms is calculated by separating waveforms and the solid soln. ratio is calculated from the calibration curve.</p>
申请公布号 JPH10111262(A) 申请公布日期 1998.04.28
申请号 JP19960267163 申请日期 1996.10.08
申请人 NGK SPARK PLUG CO LTD 发明人 UNOHARA YOSHIYUKI;USHIDA TAKAHISA
分类号 G01N23/225;(IPC1-7):G01N23/225 主分类号 G01N23/225
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