| 摘要 |
<p>PROBLEM TO BE SOLVED: To correct positional deviation between a reticle pattern and an inspection pattern in a method for inspecting the reticle pattern by which the reticle pattern fetched to the visual range of an image sensor is compared with an inspecting pattern housed in a recording medium on the surface of a reticle. SOLUTION: A positional deviation correcting pattern 14 is previously formed on a reticle pattern unformed area 13 having an area larger than the visual field range on the surface surface of the reticle 2, and the positional deviation inspecting pattern corresponding to the pattern 14 is housed in the recording medium. When the pattern 14 is fetched to the visual range of the image sensor, the corresponding positional deviation inspecting pattern is read from the recording medium and compared, and the positional deviation between the reticle pattern and the inspecting pattern is corrected based on the result.</p> |
