| 摘要 |
PROBLEM TO BE SOLVED: To provide a highly sensitive sensor by providing a weight part formed of a first weight part formed by etching and a second weight part formed by accumulation. SOLUTION: A weight part is formed of a first weight part 13a and a second weight part 13b. The weight part 13a is formed by etching, for example, a silicon substrate 1300μm in thickness from the reverse side. The weight part 13b is formed by being accumulated on the silicon base 1. The weight parts 13a, 13b are supported by a support part 11 through a beam part 12. The support part 11 is fixed to a pedestal 2. Since the weight part has a large mass according such a structure, a force proportional to the mass is added to increase the distortion of the beam 12 when an acceleration is applied, and the resistance change detected by a strain gauge on the beam part 12 is thus also increased. Therefore, a highly sensitive acceleration sensor can be provided without minimizing the width of the beam part 12 or thinning it.
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